Design Expo Reviewers

Jonathan Arnowitz, SAP Labs, Inc., USA
Maribeth Back, MIT, USA
Henry Been-Lirn Duh, Nanyang Technological University
Ruven Brooks, Rockwell Software, USA
Daniela Busse, SAP Labs, LLC., USA
Francesco Cara, usagewatch.org
Anxo Cereijo Roibas, University of Brighton, UK
Luigina Ciolfi, University of Limerick, Ireland
Alex Cuthbert, UC Berkeley, USA
Scott Davidoff, Carnegie Mellon University, USA
Jochen Denzinger, Fraunhofer Institute Media Communication, Germany
Elizabeth Dykstra-Erickson, Kinoma, Inc., USA
Shelley Evenson, Carnegie Mellon University, USA
Bernd Ewert, America Online, Inc, USA
Nancy Frishberg, Sun Microsystems, USA
William Gaver, Royal College of Art, UK
David Gilmore, IDEO, USA
Steve Harrison, Virginia Tech, USA
Caroline Hummels, Delft University of Technology, The Netherlands
Andreas Kohl, 4U technologies AG, Germany
Mary LaLomia, Philips Medical
Joonhwan Lee, Carnegie Mellon University, USA
Panos Markopoulos, Technical University Eindhoven, The Netherlands
M. Milano
Paul Moody, IBM Research, USA
Rob Mori, Sun Microsystems, USA
Ingrid Mulder, Telematica Instituut, The Netherlands
Guadalupe Muñoz, University Rey Juan Carlos, Spain
Nina Reeves, University of Gloucestershire, UK
Tim Regan, Microsoft, USA
Dave Roberts, IBM Ease of Use, UK
Francesca Rosella, CuteCircuit, Italy / USA
Mike Sips, University of Konstanz, Germany
Philippe Truillet, IRIT CNRS, France
Colin Venters, University of Manchester, UK
Ryan West, SAS Institute
Eric Wilcox, IBM Research, USA
Dennis Wixon, Microsoft Corporation, USA